Chemical Vapor Deposition : Thermal and plasma deposition of electronic materials (Electrical Engineering)
Chemical Vapor Deposition : Thermal and plasma deposition of electronic materials (Electrical Engineering)
Editorial Reviews
Book Description
This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the perspective of the properties of thin films and show how to achieve these properties by understanding and modifying deposition conditions.
Book Info
Develops the concepts of CVD from first principles and leads readers through the design of reactors and the deposition of films for the microelectronics industry. DLC: Microelectronics industry.
Chemical Vapor Deposition: Thermal and plasma deposition of electronic materials (Electrical Engineering),Srinivasan Sivaram,Springer,0442010796,Chemical vapor deposition,Control Systems,Electronics - Circuits - General,Electronics - Semiconductors,Engineering - General,General,Materials,Microelectronics,Microelectronics industry,Physical Chemistry,Science,Science/Mathematics,Technology,Circuits & components,Metals technology / metallurgy,Technology / Electronics / Circuits / General
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