Editorial Reviews
Book Description
This book describes for the first time how Monte Carlo modeling methods can be applied to electron microscopy and microanalysis. Computer programs for two basic types of Monte Carlo simulation are developed from physical models of the electron scattering process--a single scattering program
capable of high accuracy but requiring long computation times, and a plural scattering program which is less accurate but much more rapid. Optimized for use on personal computers, the programs provide a real time graphical display of the interaction. The programs are then used as the starting
point for the development of programs aimed at studying particular effects in the electron microscope, including backscattering, secondary electron production, EBIC and cathodo-luminescence imaging, and X-ray microanalysis. The computer code is given in a fully annotated format so that it may be
readily modified for specific problems. Throughout, the author includes numerous examples of how such applications can be used. Students and professionals using electron microscopes will want to read this important addition to the literature.
Book Info
Demonstrates how interactions between energetic electrons and solids can be accurately simulated and studied on a personal computer. DLC: Electron microscopy - Computer simulation.
Monte Carlo Modeling for Electron Microscopy and Microanalysis (Oxford Series on Optical and Imaging Sciences),David C. Joy,Oxford University Press, USA,0195088743,Computer Simulation,Data Modeling & Design,Electron Microscopes & Microscopy,Electron Microscopy,Electron probe microanalysis,Engineering - Electrical & Electronic,General,Monte Carlo method,Poetry,Science,Science/Mathematics,Computer modelling & simulation,Computers / Data Modeling & Design,Microscopy,Physics | Atomic, Molecular, & Optical physics,Probability & statistics
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