Principles of Lithography (SPIE PRESS Monograph Vol. PM97) (Spie Press Monograph)
Editorial Reviews
Book Description
The ability to pack large numbers of individual transistors in a small area of silicon has enabled the great functionality of modern microelectronics, specifically integrated circuits. This book focuses on photolithography--the method used for patterning nearly all integrated circuits fabricated today. It is a comprehensive introduction for novice lithographers and a valuable reference for professionals.
From the Author
This book is intended as an introduction to the science of microlithography for those new to the subject, and it covers advanced topics useful to experienced lithographers who seek information outside their own areas of expertise. Numerous references to the literature in optical lithograpy will guide both novice and experienced lithographers who want greater detail in specific areas.
A number of discussions--such as thin-resist modeling, metrics for imaging, thin-film optics, and the modeling of focus effects--first appeared in Advanced Micro Design internal reports. Eventually, parts of these reports were published elsewhere. Their tutorial nature is not coincidental, as they were analyses that I used to develop my own understanding of lithography. Complex situations often are best comprehended through simple models that describe the relevant physics, with remaining effects considered as perturbations. This is the approach I used in learning lithography and it is the method used here.
Students in my classes on lithography science will recognize many of the figures and equations. Several also appear in the first chapter of the SPIE Handbook on Microlithography, Micromachining, and Microfabrication, Volume I: Microlithography, which I coauthored with Bill Arnold of ASM Lithography. Other topics have been added or significantly expanded, especially those concerning light sources, photomasks, and next-generation lithography. The chapter on photoresists is approached from the perspective of the practicing lithographer, rather than the resist chemist. Some knowledge of resist chemistry is essential for using resists properly, but the emphasis here is on operational considerations.
Principles of Lithography (SPIE PRESS Monograph Vol. PM97) (Spie Press Monograph)
Principles of Lithography (SPIE PRESS Monograph Vol. PM97) (Spie Press Monograph),Harry J. Levinson,SPIE-International Society for Optical Engine,0819440450,Design and construction,Electronics - Circuits - Integrated,Electronics - Microelectronics,Engineering - Electrical & Electronic,General,Integrated circuits,Microlithography,Science,Science/Mathematics,Technology & Industrial Arts,Technology / Electronics / Circuits / General,Technology / Optics,Electronics - Circuits - General,Optics,Technology
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